翻訳と辞書 |
Nanosphere lithography : ウィキペディア英語版 | Nanosphere lithography Nanosphere lithography (NSL) is an economical technique for generating single-layer hexagonally close packed or similar patterns of nanoscale features. Generally, NSL applies planar ordered arrays of nanometer-sized latex or silica spheres as lithography masks to fabricate nanoparticle arrays. NSL uses self-assembled monolayers of spheres (typically made of polystyrene) as evaporation masks. This method has been used to fabricate arrays of gold nanodots with precisely controlled spacings. ==See also==
*Nanolithography
抄文引用元・出典: フリー百科事典『 ウィキペディア(Wikipedia)』 ■ウィキペディアで「Nanosphere lithography」の詳細全文を読む
スポンサード リンク
翻訳と辞書 : 翻訳のためのインターネットリソース |
Copyright(C) kotoba.ne.jp 1997-2016. All Rights Reserved.
|
|